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Git Commits -> Revision d8c99ac

February 11, 2020, 16:12 (GMT)
GPencil: Refactor: Add per mask inversion capability

With this commit, masks can be inverted per layer. Inversion means the
mask becomes subtractive instead of additive. The base visibility does not
change depending on the first type (i.e: if ther is nothing in the mask
layer, nothing will be masked regardless of the mask type).

Commit Details:

Full Hash: d8c99ac34e62fd7606efdc1fafeba512a704ad0e
Parent Commit: bc25c6a
Lines Changed: +66, -12

1 Added Path:

/source/blender/draw/engines/gpencil/shaders/gpencil_mask_invert_frag.glsl (+11, -0) (View)

6 Modified Paths:

/source/blender/draw/CMakeLists.txt (+1, -0) (Diff)
/source/blender/draw/engines/gpencil/gpencil_cache_utils.c (+6, -4) (Diff)
/source/blender/draw/engines/gpencil/gpencil_engine.c (+31, -6) (Diff)
/source/blender/draw/engines/gpencil/gpencil_engine.h (+4, -0) (Diff)
/source/blender/draw/engines/gpencil/gpencil_shader.c (+12, -0) (Diff)
/source/blender/draw/engines/gpencil/shaders/gpencil_layer_blend_frag.glsl (+1, -2) (Diff)
Tehnyt: Miika HämäläinenViimeksi päivitetty: 07.11.2014 14:18MiikaH:n Sivut a.k.a. MiikaHweb | 2003-2021