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Git Commits -> Revision 6c64318

January 25, 2021, 18:41 (GMT)
EEVEE: Depth Of Field: Improve scatter rejection masks

This update the rejection with smooth tests which fades the
pixels between scattering and gathering convolutions.

Commit Details:

Full Hash: 6c6431809daaa2dd98efeed1d2b29278ced3c867
Parent Commit: 3f0213d
Lines Changed: +38, -13

1 Modified Path:

/source/blender/draw/engines/eevee/shaders/effect_dof_reduce_frag.glsl (+38, -13) (Diff)
Tehnyt: Miika HämäläinenViimeksi päivitetty: 07.11.2014 14:18MiikaH:n Sivut a.k.a. MiikaHweb | 2003-2021