Blender Git Loki
Git Commits -> Revision 10f2e39
February 7, 2020, 22:43 (GMT) |
GPencil: Refactor: New linked mask system The new system is more flexible and a bit simpler from the code side. Each layer has a mask layer slot. If filled with a correct layer name, the mask layer will be rendered again in a separate buffer. This buffer will then be used in the blend pass to modulate the opacity of the layer. This approach is not 100% equivalent to the standard layering in most 2D applications if using varying alpha on a mask applied to multiple layers. However this technique does support any ordering arrangement of the masks. The layers used as mask can now still render normaly. |
Commit Details:
Full Hash: 10f2e39f4803ca4f1110f3866e7aae1ac29acc95
Parent Commit: 4e2cb23
Lines Changed: +86, -137
1 Deleted Path:
/source/blender/draw/engines/gpencil/shaders/gpencil_layer_mask_frag.glsl (+0, -37)
8 Modified Paths:
/source/blender/blenkernel/BKE_gpencil.h (+1, -0) (Diff)
/source/blender/blenkernel/intern/gpencil.c (+8, -0) (Diff)
/source/blender/draw/CMakeLists.txt (+0, -1) (Diff)
/source/blender/draw/engines/gpencil/gpencil_cache_utils.c (+30, -49) (Diff)
/source/blender/draw/engines/gpencil/gpencil_engine.c (+28, -30) (Diff)
/source/blender/draw/engines/gpencil/gpencil_engine.h (+12, -7) (Diff)
/source/blender/draw/engines/gpencil/gpencil_shader.c (+0, -12) (Diff)
/source/blender/draw/engines/gpencil/shaders/gpencil_layer_blend_frag.glsl (+7, -1) (Diff)
/source/blender/blenkernel/intern/gpencil.c (+8, -0) (Diff)
/source/blender/draw/CMakeLists.txt (+0, -1) (Diff)
/source/blender/draw/engines/gpencil/gpencil_cache_utils.c (+30, -49) (Diff)
/source/blender/draw/engines/gpencil/gpencil_engine.c (+28, -30) (Diff)
/source/blender/draw/engines/gpencil/gpencil_engine.h (+12, -7) (Diff)
/source/blender/draw/engines/gpencil/gpencil_shader.c (+0, -12) (Diff)
/source/blender/draw/engines/gpencil/shaders/gpencil_layer_blend_frag.glsl (+7, -1) (Diff)