Blender Git Commit Log
Git Commits -> Revision 8509e94
Revision 8509e94 by Campbell Barton (master) July 24, 2012, 19:29 (GMT) |
initial commit for supporting masks in the image view, currently active seq strip is used as the mask source. also unify mask drawing code for clip/sequencer/image |
Commit Details:
Full Hash: 8509e94d3ad69aaa2bb3b14c5669ea9d596e3fd0
SVN Revision: 49182
Parent Commit: 72a106d
Lines Changed: +154, -118
7 Modified Paths:
/source/blender/editors/include/ED_mask.h (+10, -1) (Diff)
/source/blender/editors/mask/mask_draw.c (+74, -0) (Diff)
/source/blender/editors/mask/mask_edit.c (+20, -9) (Diff)
/source/blender/editors/mask/mask_intern.h (+0, -3) (Diff)
/source/blender/editors/space_clip/space_clip.c (+13, -45) (Diff)
/source/blender/editors/space_image/space_image.c (+26, -4) (Diff)
/source/blender/editors/space_sequencer/sequencer_draw.c (+11, -56) (Diff)
/source/blender/editors/mask/mask_draw.c (+74, -0) (Diff)
/source/blender/editors/mask/mask_edit.c (+20, -9) (Diff)
/source/blender/editors/mask/mask_intern.h (+0, -3) (Diff)
/source/blender/editors/space_clip/space_clip.c (+13, -45) (Diff)
/source/blender/editors/space_image/space_image.c (+26, -4) (Diff)
/source/blender/editors/space_sequencer/sequencer_draw.c (+11, -56) (Diff)
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