June 23, 2010, 09:14 (GMT) |
DXF-exporter script update: v1.37 - 2010.06.23 by migius - APPLY-MODIFIER: added exception for modifier-free instances to export them as BLOCK/INSERTs DXF-export library update: v1.35 - 2010.06.23 by migius - added (as default) writing to DXF file without RAM-buffering: faster and low-RAM-machines friendly |
June 23, 2010, 05:56 (GMT) |
Beginning to optimize smooth brush in multires mode. Not complete, smooth brush with multires may not work correctly and it may not be any faster yet. |
June 23, 2010, 02:40 (GMT) |
<Uncle_Entity> phoenix_: needed this to get cross-compile working -> http://www.pasteall.org/13946/diff -- still has a linking error though (can't find -lgomp) |
June 22, 2010, 18:36 (GMT) |
June 22, 2010, 14:14 (GMT) |
June 22, 2010, 10:52 (GMT) |
June 21, 2010, 19:46 (GMT) |
More changes in prepping for mask layers: * Reversed direction of mask strength * Changed subsurf_make_derived_from_derived to take a gridkey parameter, or NULL for the default key (just coords + normals) |
June 21, 2010, 16:58 (GMT) |
Render Branch: simplify option for shadow buffer size. |
June 21, 2010, 14:16 (GMT) |
Render Branch: fix bug raytracing instanced objects with use instancing disabled for the raytracer. |
June 21, 2010, 11:43 (GMT) |
Made sure all the same UI controls appear for Clay and Wax. |
June 21, 2010, 11:39 (GMT) |
== Wax & Clay Brushes == The old clay brush has been renamed 'Wax', this brush fills in crevices below the offset plane and does not effect brushes above it. A new Clay brush has been created that is like 'Flatten' with a high plane offset. It brings things up to the offset plane while lowering things above it. On top of that, the default offset for clay and wax has been lowered to half the brush radius and the plane offset slider now only goes from -0.5 to 0.5. This has the effect of flattening clay and wax and makes them less like draw (so please, no more "clay is just like draw" comments :P) |
June 21, 2010, 11:03 (GMT) |
no functional changes * couple of functions that I may be using in the future to optimize bounding box recalculation |
June 21, 2010, 09:02 (GMT) |
June 21, 2010, 06:55 (GMT) |
== Optional OpenMP == OpenMP can be re-enabled by checking "Use OpenMP" Also, area normal and tangent plane are not unnecessarily recalculated for symmetry but are simply flipped. |
June 21, 2010, 05:37 (GMT) |
June 21, 2010, 05:18 (GMT) |
minor changes, no need to redistribute |
June 20, 2010, 19:21 (GMT) |
DXF-exporter script update: v1.36 - 2010.06.20 by migius - added export Nurbs-Curve (3,4,5th-degree) into POLYLINE-NURBS(quad,cubic) but no support for Bezier-Curves, because DXF doesnt support them DXF-export library update: v1.34 - 2010.06.20 by migius - bugfix POLYFACE - added DXF-flags for POLYLINE and VERTEX class (NURBS-export) |
June 20, 2010, 18:55 (GMT) |
* Added paint mask mask to editmode mask so it's not destroyed when going into editmode. |
June 20, 2010, 17:42 (GMT) |
* Added mesh rna for paint masks * Added operators to add/remove paint mask layers * Added UI to select paint mask layer and add/remove Note that this commit doesn't include the code for actually using multiple layers in sculpt mode. |
June 20, 2010, 15:38 (GMT) |
Render Branch: trying to fix windows compile. |
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